Berlin 2018 – wissenschaftliches Programm
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BP: Fachverband Biologische Physik
BP 24: Bioinspired Functional Materials, Biomaterials and Biopolymers (joint session CPP/BP)
BP 24.4: Vortrag
Mittwoch, 14. März 2018, 15:45–16:00, PC 203
Cellulose-Based Photoresist for Two-Photon Lithography — •Marie-Christin Angermann1, Maximilian Rothammer2, Cordt Zollfrank2, and Georg von Freymann1,3 — 1Physics Department and Research Center OPTIMAS, TU Kaiserslautern, 67663 Kaiserslautern, Germany — 2Chair of Biogenic Polymers, TU Munich, Campus Straubing of Biotechnology and Sustainability, 94315 Straubing, Germany — 3Fraunhofer Institute for Industrial Mathematics ITWM, 67663 Kaiserslautern, Germany
Lithography is a common method for structuring which uses photoresists based on polymers extracted from mineral oil. To conserve resources those polymers could be replaced by sustainable materials like polysaccharides. So far, no polysaccharide based photoresist has been presented. We here present such a resist by using functionalized cellulose which can be photo-crosslinked by a photoinitiator. For this cellulose and initiator are dissolved in acetone. The resist is curable with two-photon absorption (780 nm) in a direct laser writing system (DLW), and via one-photon absorption with a UV lamp (365 nm), in liquid state as well as in dried state, after evaporation of the acetone. Using DLW and a liquid resist a resolution of 1.6 µm with a feature size of 600 nm is achieved. Furthermore, it is possible to fabricate three dimensional structures. The threshold for polymerization with the DLW depends on the amount of initiator and the amount of acetone influences mainly the durability of the resist.
This resist opens up a new class of photoresist based on sustainable materials.