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09:30 |
CPP 61.1 |
Topical Talk:
Approaching the Shockley-Queisser Limit with Interface Control in Halide Perovskites — •David Ginger
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10:00 |
CPP 61.2 |
Active Materials and interfaces for stable perovskite solar cells — •Antonio Abate
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10:15 |
CPP 61.3 |
Visualizing and suppressing interfacial recombination in high efficiency large area pin-perovskite solar cells — •Martin Stolterfoht, Christian M. Wolff, Shanshan Zhang, José A. Márquez Prieto, Charles J. Hages, Daniel Rothhardt, Thomas Unold, Steve Albrecht, Paul L. Burn, Paul Meredith, and Dieter Neher
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10:30 |
CPP 61.4 |
Passivating perovskite surfaces by mixtures of PEDOT and dopant-free Spiro-OMeTAD — •L. Kegelmann, C. M. Wolff, J. A. Márquez Prieto, P. Tockhorn, T. Unold, D. Neher, B. Rech, and S. Albrecht
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10:45 |
CPP 61.5 |
Revealing the impact of Rubidium and Cesium on the electronic trap landscape of mixed cation perovskite solar cells via thermally stimulated current — •Philipp Rieder, Yinghong Hu, Alexander Hufnagel, Meltem Aygüler, Michiel Petrus, Pablo Docampo, Kristofer Tvingstedt, Andreas Baumann, Thomas Bein, and Vladimir Dyakonov
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11:00 |
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15 min. break
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11:15 |
CPP 61.6 |
Topical Talk:
Understanding Hysteresis in Perovskite Solar Cells — •Stefan A.L. Weber, Ilka M. Hermes, Niklas M. Budinger, Wolfgang Tress, Anders Hagfeldt, Michael Graetzel, and Rüdiger Berger
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11:45 |
CPP 61.7 |
Recombination in Perovksite Solar Cells — •Wolfgang Tress
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12:00 |
CPP 61.8 |
The contribution has been withdrawn.
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12:15 |
CPP 61.9 |
Surface State Density Determines the Energy Level Alignment at Hybrid Perovskite/Electron Acceptor Interfaces — •Fengshuo Zu, Patrick Amsalem, Maryline Ralaiarisoa, Thorsten Schultz, Raphael Schlesinger, and Norbert Koch
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12:30 |
CPP 61.10 |
Self-assembled Monolayers Enhance the Stability and Efficiency of p-i-n Perovskite Solar Cells — •Christian Wolff, Martin Stolterfoht, Yohai Amir, Antonio Abate, and Dieter Neher
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12:45 |
CPP 61.11 |
Structure and electronic properties characterization of CH3NH3PbI3−xClx mixed halide perovskite films upon massive solvents exposure — •Maryline Ralaiarisoa, Yerila Rodriguez, Ingo Salzmann, Lidice Vaillant, and Norbert Koch
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