Berlin 2018 – wissenschaftliches Programm
DS 19: Lithography I: Focused Electron Beam Induced Processing: 3D Nano-Printing for Material Science (Focussed Session): Morning Session (joint session DS/KFM)
DS 19.1: Hauptvortrag
Mittwoch, 14. März 2018, 09:30–10:00, H 2032
3D direct-write nanofabrication using an electron beam — •Jason Fowlkes1, Robert Winkler2,3, Eva Mutunga4, Brett Lewis5, Harald Plank2,3, and Philip Rack5 — 1Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831, USA — 2Institute for Electron Microscopy and Nanoanalysis, Graz University of Technology, 8010 Graz, Austria — 3Graz Centre for Electron Microscopy, 8010 Graz, Austria — 4Bredesen Center for Interdisciplinary Research, The University of Tennessee, Knoxville, 37996, USA — 5Department of Materials Science and Engineering, The University of Tennessee, Knoxville, 37996, USA
The deposition of 3D nanomaterials with precise geometry and function constitutes a major goal of nanoscience. Currently, the preeminent method for nanoprinting is focused electron beam-induced deposition(FEBID). During FEBID, the electron beam is scanned along a surface inducing the fragmentation and deposition of absorbed precursor molecules. Until recently, the suite of 3D objects that could be deposited was limited by the trial and-error nature of experiments and poor material quality. Our team has taken significant steps toward overcoming both roadblocks, the former being the focus of the current presentation. A FEBID CAD program will be presented that makes it possible to deposit complex, 3D nanoscale mesh style objects spanning micrometer length scales. A FEBID simulation will also be discussed. The simulation to CAD to experiment process flow will be demonstrated for the case of tailoring mesh object nanowire cross-sections.