Berlin 2018 – wissenschaftliches Programm
DS 23: Lithography II: Focused Electron Beam Induced Processing: 3D Nano-Printing for Material Science (Focussed Session): Afternoon Session (joint session DS/KFM)
DS 23.1: Vortrag
Mittwoch, 14. März 2018, 15:00–15:15, H 2032
FEBIP on Metal-Organic Frameworks — •Christian Preischl1, Elif Bilgilisoy1, Florian Vollnhals1, Kai Ahlenhof2, Petra Swiderek2, Hartmut Gliemann3, Christof Wöll3, and Hubertus Marbach1 — 1Physik. Chemie II, FAU Erlangen — 2IAPC, Universität Bremen — 3Institut f. funktionelle Grenzflächen, KIT
We report the fabrication of nanostructures down to single digit nanometer scale on metal-organic frameworks (MOFs) by FEBIP. Next to EBID, our second technique is Electron Beam Induced Surface Activation (EBISA). In EBISA the surface is locally activated by an electron beam and the subsequently dosed precursor is catalytically decomposed at the activated sites and forms a deposit. Both approaches were investigated with Fe(CO)5 and Co(CO)3NO on HKUST-1 and Cu-oxalate which is somewhat similar to HKUST-1 but the benzylic part in the organic linker is missing compared to the latter. Both samples were grown in a layer-by-layer method. We demonstrate that both precursors are suitable for EBID on both samples, whereas EBISA works only with Fe(CO)5 on the HKUST-1. We will compare the corresponding results and discuss especially the high potential of MOFs as substrates for novel FEBIP processes towards the fabrication 3D materials.
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