Berlin 2018 – wissenschaftliches Programm
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DS: Fachverband Dünne Schichten
DS 31: Poster Session II
DS 31.26: Poster
Donnerstag, 15. März 2018, 11:15–13:15, Poster F
Microstructure and mechanical properties of Mo2N/CrN multilayers deposited by DC magnetron sputtering — •boudjemaa bouaouina1, cristophe tromas2, dominique eyidi2, céderic mastail2, anny michel2, sedik elhak abaidia1, and grégory abadias2 — 1Département de physique, Unité de recherche UR-MPE, Université de Boumerdès 35000, Algerie — 2Insitut Pprime, Department of Physics and Mechanics of Materials, Université de Poitiers-CNRS-ENSMA, 86962 Chasseneuil-Futuroscope, France
The multilayer films Mo2N/CrN were deposited by reactive magnetron sputtering at 600°C on Si substrates with different bi-layer periods λ ranging from 5 to 50 nm. The microstructure of the multilayer was investigated from X-ray diffraction and scanning electron microscopy (cross section images). Both films, Mo2N and CrN deposited at 600°C present a face centered cubic structure. As the bi-layer period was decreased, the grain size increases from 14 to 20 nm and are well crystallized with (200) preferred orientation. The nanohardness measurements show that the mechanical properties of Mo2N/CrN multilayers depend on the bi-layer period and the highest value of 29 GPa was obtained at the bilayer period of 10 nm.