Berlin 2018 – wissenschaftliches Programm
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DS: Fachverband Dünne Schichten
DS 31: Poster Session II
DS 31.7: Poster
Donnerstag, 15. März 2018, 11:15–13:15, Poster F
Nanocrack networks: a systematic approach for surface tailoring of sputter deposited oxide thin films — •Alexander Vahl1, Jan Dittmann1, Bodo Henkel1, Oral Cenk Aktas1, Thomas Strunskus1, Suman Kumar Sharma2, and Franz Faupel1 — 1Christian-Albrechts University at Kiel, Institute for Materials Science, Chair for Multicomponent Materials, Kaiserstr. 2, 24143, Kiel, Germany — 2Department of Physics, Malaviya National Institute of Technology, Jaipur 302017, India
Surface roughness is a critical parameter for various thin film applications, influencing properties like wetting and catalytic performance. Thermally induced nanocrack network formation is an efficient tool to modify the surface of thin films. We report on the fundamental process of nanocrack network formation, showcased at the example TiO2 and Al2O3 thin films deposited by pulsed reactive DC magnetron sputtering. In case of TiO2, the amount of oxygen during the deposition process was found to be crucial for the formation of crystalline anatase seeds in the as deposited thin film. In a post deposition heat treatment step, the preexisting structural features densified and gave rise to a connected network of nanoscopic cracks. In case of Al2O3, independent of the oxygen content the thin film showed high resiliency against crystallization and accordingly no connected nanocrack network was observed.