Berlin 2018 – wissenschaftliches Programm

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DS: Fachverband Dünne Schichten

DS 36: Organic Thin Films, Organic-Inorganic Interfaces: Session II (joint session DS/CPP)

DS 36.5: Vortrag

Freitag, 16. März 2018, 10:30–10:45, H 0111

Study of reactive ion beam planarization process of a negative tone resist for smoothing aluminium mirrors — •Melanie Ulitschka, Jens Bauer, Frank Frost, and Thomas Arnold — Leibniz-Institut für Oberflächenmodifizierung, Permoserstraße 15, 04318 Leipzig

Mirror optics are a key component for a wide range of optical systems in lithography, imaging, as well as aerospace industry. For such a specific field of applications lightweight, good machinable aluminum alloys are suitable since the reflection coefficient ranges from the UV to the IR spectral region with values well above 90%. The surface error topography after commonly manufacturing by single-point diamond turning meets the requirements for applications in the infrared spectral range. To use the aluminum mirrors in the shortwave visible and UV-spectral range one technological solution is the coating of the Al optics with a nickel-phosphorous layer and a metallization layer on top to realize ultra-smooth highly reflective surfaces. Further reduction of the surface roughness of aluminum optics and a simplification of this process chain is preferable.Ion beam planarization processes are a promising technology to transfer the ultra-smooth surface of a planarization layer into the underlying aluminum substrate. An equal etch rate for planarization layer and aluminum is the prerequisite for the transfer process. The contribution comprises investigations on the influence of different ion beam parameters on the chemical modification of the layer during the etch process, the effect of thermal pre-treatment of the planarization layer and the etch rate selectivity of layer and substrate.