Berlin 2018 – wissenschaftliches Programm
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HL: Fachverband Halbleiterphysik
HL 50: HL Poster IV
HL 50.52: Poster
Donnerstag, 15. März 2018, 19:00–21:00, Poster B
Development of industrially compatible patterning processes for the fabrication of IBC-SHJ solar cells — •Philipp Wagner1,2, Johann-Christoph Stang2, Lars Korte2, Christof Schultz1,3, Bernd Stannowski3, Bert Stegemann1, and Bernd Rech2 — 1HTW Berlin, Wilhelminenhofstraße 75a, D-12459 Berlin — 2HZB, Institut für Silizium-Photovoltaik, Kekuléstraße 5, D-12489 Berlin — 3PVcomB/HZB, Schwarzschildstraße 3, D-12489 Berlin
The interdigitated back contacted silicon hetero-junction (IBC-SHJ) solar cell is the ultimate Si wafer-based high efficiency approach with record power conversion efficiencies of 26.6 % [1]. It combines the advantages of IBC cells (i. e. high jsc and FF by small optical and resistive losses, respectively) and SHJ cells (i. e. high Voc by excellent interface passivation). Contact preparation of such solar cells with lab-based photolithographic processes yields high cell efficiencies [2], but is complex and costly and therefore not applicable in industrial fabrication. Hence it is the main objective of our work to develop simplified and damage-free, industrially compatible fabrication processes, while maintaining exceptional cell properties. Here we demonstrate the successful development of a photolithography-free patterning technique using shadow masks and compare the challenges and advantages with screen printing and laser ablation. First solar cell results are presented and discussed with respect to further improvement of the passivation and minimisation of the contact resistance.
[1] K. Yoshikawa et al. (2017). Nature Energy, 2, 17032.
[2] J.-C. Stang et al. (2017). JJAP, 56(8S2), 08MB22