Berlin 2018 – wissenschaftliches Programm

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MA: Fachverband Magnetismus

MA 21: Poster I

MA 21.104: Poster

Dienstag, 13. März 2018, 09:30–13:00, Poster A

ALD growth of Fe₂O₃ thin films using Ferrocene and Ozone as precursors — •Michaela Lammel^{1, 2}, Andy Thomas¹, and Kornelius Nielsch^{1, 2, 3} — ¹Leibniz Institute for Solid State and Materials Research Dresden (IFW Dresden), Institute for Metallic Materials, 01069 Dresden, Germany — ²Technische Universität Dresden, Institute of Applied Physics, 01062 Dresden, Germany — ³Technische Universität Dresden, Institute of Materials Science, 01062 Dresden, Germany

Antiferromagnetic spintronics is currently one of the main research topics in magnetism due to the robustness of antiferromagnets against disturbances by external fields. Fe₂O₃ is a promising material system to study the magnetization dynamics in antiferromagnets. Fe₂O₃ exists mainly in two phases: antiferromagnetic α- and ferrimagnetic γ-Fe₂O₃.

We fabricate Fe₂O₃ thin films on Si/SiO₂ substrates by atomic layer deposition (ALD) using ferrocene and ozone as precursors. X-ray reflectometry was used to extract the thickness of the Fe₂O₃ films. Furthermore, the composition of the films was determined by EDX measurements. In our studies, we identified the best parameters to maximize the growth rate per cycle. In a next step, the attention will first be focused on the growth of phase-pure α- and γ-Fe₂O₃. Afterwards, we plan to perform a reduction of the Fe₂O₃ thin films into ferromagnetic Fe₃O₄ as already reported in Ref. [1]. Using ALD not only allows us to deposit thin films, but it also enables us to get conformal coatings of 3D-templates with magnetic materials.

[1] Zierold et al., Journal of Physics D, Vol 47, 485001 (2014)