Berlin 2018 – wissenschaftliches Programm
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O: Fachverband Oberflächenphysik
O 36: 2D materials beyond graphene: TMDCs, silicene and relatives I
O 36.8: Vortrag
Dienstag, 13. März 2018, 15:45–16:00, MA 043
Corrugation in the weakly interacting h-BN/Cu(111) system — Martin Schwarz1, Alexander Riss1, Manuela Garnica1, Jacob Ducke1, Peter S Deimel2, David A Duncan2, Pardeep Kumar Thakur2, Tien-Lin Lee2, •Ari P Seitsonen3, Johannes V Barth1, Francesco Allegretti1, and Willi Auwärter1 — 1Technical University of Munich, Department of Physics, Garching — 2Diamond Light Source, Harwell Science and Innovation Campus, Didcot — 3Département de Chimie, École Normale Supérieure, Paris
Atomically thin hexagonal boron nitride (h-BN) layers on metallic supports represent a promising platform for the selective adsorption of atoms, clusters, and molecular nanostructures. Here we employ complementary techniques including high-resolution noncontact atomic force microscopy, scanning tunnelling microscopy, low-energy electron diffraction, X-ray photoelectron spectroscopy, the X-ray standing wave method, and density functional theory to yield a comprehensive, quantitative structure determination including the adsorption height and the corrugation of the sp2-bonded h-BN layer on Cu(111) [1]. We compare the results to the adsorption structures of h-BN on other transition and coinage metal surfaces, in particular to h-BN/Ir(111) [2,3].
[1] Schwarz et alia, ACS Nano 11, 9151-9161 (2017); DOI: 10.1021/acsnano.7b04022
[2] zum Hagen et alia, ACS Nano 10, 11012-11026 (2016); DOI: 10.1021/acsnano.6b05819
[3] Seitsonen, Schulz and Liljeroth, in preparation