Berlin 2018 – wissenschaftliches Programm
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O: Fachverband Oberflächenphysik
O 51: Poster: Electronic Structure of Surfaces: Spectroscopy, Surface States
O 51.14: Poster
Dienstag, 13. März 2018, 18:15–20:30, Poster B
STM/AFM study of local work function variations on h-BN/Cu(111) — •Abhishek Grewal1, Matthias Muenks1, Yuqi Wang1, Markus Ternes1, and Klaus Kern1,2 — 1Max Planck Institute for Solid State Research, Heisenbergstrasse 1, 70569 Stuttgart, Germany — 2Institut de Physique, École Polytechnique Fédérale de Lausanne, CH-1015 Lausanne, Switzerland
The adsorption of single atoms or molecules on surfaces is mediated by their interaction with the substrate. The surfaces must, therefore, be characterized and understood from the structural, chemical and electronic point of view. In this respect, the nanometer scale local work function variations of the hexagonal boron nitride (h-BN) decoupling layer have been used for explaining favorable adsorption sites and molecular arrangements [1,2]. Using a tuning-fork based combined STM/AFM at 1 K base temperature we study h-BN on a Cu(111) substrate. We find bias dependent electronic corrugations by analyzing constant current and constant height STM images. We compare the local work function variation obtained by field emission resonance states [3] and complimentary Kelvin probe force microscopy at the different areas of this corrugation. Analyzing three-dimensional force maps we do not observe the soft stiffness previously found on h-BN/Rh(111) samples [4].
1. H. Dil et al., Science 319, 1824 (2008).
2. P. Jacobson et al., Nat. Comm. 6, 8536 (2015).
3. S. Joshi et al., Nano Lett. 12, 5821 (2012).
4. T. Herden et al., Nano Lett. 14, 3623 (2014).