Berlin 2018 – wissenschaftliches Programm
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O: Fachverband Oberflächenphysik
O 74: Nanostructures at surfaces: Other aspects
O 74.2: Vortrag
Mittwoch, 14. März 2018, 17:00–17:15, MA 141
Nanostructuring of dielectric surfaces by nanosecond laser irradiation — •Pierre Lorenz1, Xiongtao Zhao2, Martin Ehrhardt1,2, Frank Frost1, Joachim Zajadacz1, Igor Zagoranskiy1, Klaus Zimmer1, and Bing Han2 — 1Leibniz-Institut für Oberflächenmodifizierung e. V., Permoserstr. 15, 04318 Leipzig, Germany — 2Advanced Launching Co-innovation Center, Nanjing University of Science and Technology, 200 XiaoLingWei, 210094 Nanjing, Jiangsu, China
Nanostructuring of dielectric surfaces by nanosecond laser irradiationIndustrial utilisation of a laser-generated nano-structuring process requires a fast and cost-effective patterning approach. The so-called ISPM-LIFE (laser-induced front side etching using in-situ pre-structured metal layer) method allows the nanostructuring of dielectric surfaces in a two-step process: (i) a low laser fluence irradiation results in a nanopattern formation of the thin metal film, caused by laser-irradiation instabilities of the molten metal film and (ii) subsequent high-fluence laser pulses of those pre-structured metal pattern (e.g. holes in metal film, metal reticular-like structures and metal droplets) results in nanostructuring of the dielectric surface by *transferring* those metal patterns. The surface nanostructuring of fused silica and sapphire was studied with different nanosecond laser (wavelength 248 nm, 532 nm and 1064 nm using single and double laser pulses) and applying a thin metal layer (chromium and molybdenum with layer thicknesses from 10 nm to 50 nm). The intermediate and the final structures were investigated by AFM and SEM.