Berlin 2018 – wissenschaftliches Programm
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O: Fachverband Oberflächenphysik
O 92: Nanostructures at surfaces: Dots, particles, clusters I
O 92.6: Vortrag
Donnerstag, 15. März 2018, 12:00–12:15, MA 141
Tailoring gold cluster growth during sputter deposition on polymer surfaces via pressure and bias voltage. — •Matthias Schwartzkopf1, Oleksandr Polonskyi2, Alexander Hinz2, Thomas Strunskus2, Franziska C. Löhrer3, Volker Körstgens3, Franz Faupel2, Peter Müller-Buschbaum3, and Stephan V. Roth1,4 — 1DESY, 22607 Hamburg — 2CAU, 24143 Kiel — 3TUM, 85748 Garching — 4KTH, 10044 Stockholm
The utilization of sputter deposition stands out as a versatile routine method in industry and science to precisely adjust properties of metal coatings depending on the application requested. In order to obtain full control over the nanostructural evolution at the metal-polymer interface, we employed time-resolved surface sensitive X-ray scattering (GISAXS) during sputter deposition of gold on thin polystyrene films [1,2]. We correlate the evolution of the metallic layer morphology with changes in the key scattering features. We identify the impact of atomic deposition rate, noble gas pressure and bias voltage on the growth regimes. Whereas the deposition rates effects mainly the nucleation and cluster percolation, the gas pressure and bias voltage influence the degree of order in the cluster assembly. [1] Schwartzkopf et al., ACS Appl. Mater. Interfaces 7, 13547 (2015); [2] Schwartzkopf et al., ACS Appl. Mater. Interfaces 9, 5629 (2017).