K 7: Internal Symposium Optic Coatings and Plasma Technology
Donnerstag, 8. März 2018, 10:30–13:00, MB HS
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10:30 |
K 7.1 |
Hauptvortrag:
A global model for radio frequency magnetron sputtering processes — •Dennis Engel, Laura Kroll, and Ralf Peter Brinkmann
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11:00 |
K 7.2 |
Hauptvortrag:
The Multipole Resonance Probe as a powerful diagnostic tool for industrial plasma processes — •Moritz Oberberg, Stefan Ries, Christian Wölfel, Jens Harhausen, Dennis Pohle, Christian Schulz, Oliver Schmidt, Wladislaw Dobrygin, Ilona Rolfes, Ralf Peter Brinkmann, and Peter Awakowicz
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11:30 |
K 7.3 |
Hauptvortrag:
Prospects for the enhancement of PIAD processes by monitoring of optical thickness and plasma parameters — •Jens Harhausen, Rüdiger Foest, Margarita Baeva, Detlef Loffhagen, Olaf Stenzel, Steffen Wilbrandt, Christian Franke, Norbert Kaiser, and Ralf Peter Brinkmann
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12:00 |
K 7.4 |
Hauptvortrag:
Stabilisierung von Rate und Schichtdickenuniformität im IBS-Prozess über adaptiv geregelte Prozessparameter — •Florian Carstens, Henrik Ehlers und Detlev Ristau
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12:30 |
K 7.5 |
Hauptvortrag:
Structural and optical properties of virtual materials — •Holger Badorreck, Marco Jupé, and Detlev Ristau
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