Erlangen 2018 – wissenschaftliches Programm
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P: Fachverband Plasmaphysik
P 13: Low Pressure Plasmas - Poster
P 13.7: Poster
Dienstag, 6. März 2018, 16:15–18:15, Redoutensaal
Characterization of a portable measurement device for the determination of absolute VUV emission of low pressure plasmas — •Caecilia Fröhler1, Roland Friedl1, Stefan Briefi1,2, and Ursel Fantz1,2 — 1AG Experimentelle Plasmaphysik, Universität Augsburg, 86135 Augsburg — 2Max-Planck-Institut für Plasmaphysik, Boltzmannstr. 2, 85748 Garching
Photon fluxes in the vacuum ultraviolet spectral region (VUV, wavelength below 200 nm) play a role during surface treatment processes with low pressure plasmas. Depending on the photon wavelength and the application, VUV radiation can have beneficial or undesirable effects on the surface material. For obtaining wavelength-resolved information on photon fluxes, expensive and large vacuum spectrometers are neccessary which have to be calibrated specifically at the discharge setup of use. For this reason, a small and portable measurement system based on a silicon VUV diode is being under development in which spectral resolution is achieved by using bandpass or edge filters. Its calibration is independent of the setup what makes the device transferable to any type of plasma application. An absolute calibration is performed against a calibrated VUV spectrometer in a laboratory hydrogen ICP discharge (Ø15 cm, height 10 cm; 2 MHz; 2 kW). The spectral composition is investigated simultaneously with the spectrometer and the diode system for pressure and power scans in order to demonstrate the applicability as an easy-to-use diagnostic tool for VUV fluxes.