Erlangen 2018 – wissenschaftliches Programm
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P: Fachverband Plasmaphysik
P 2: Low Pressure Plasmas I
P 2.3: Vortrag
Montag, 5. März 2018, 11:15–11:30, KI 1.174
Correlation of current shape and surface poisoning in reactive high power impulse magnetron sputtering by means of X-ray photoelectron spectroscopy — •Sascha Monjé1, Vincent Layes1, Carles Corbella1, Achim von Keudell1, Teresa de los Arcos2 und Volker Schulz-von der Gathen1 — 1Experimental Physics II, Ruhr-University Bochum, Germany — 2Technical and Macromolecular Chemistry, Paderborn University, Germany
High power impulse magnetron sputtering (HiPIMS) has established itself as one of the premier methods for depositing high quality hard coatings. Reactive gases can be added to the discharge to produce hard ceramic coatings. These gases can react with the target surface which is called target poisoning". It has often been claimed that target poisoning is accompanied by a strong change of the current waveform but direct experimental verification is still needed. This was addressed by connecting spatially resolved X-ray photoelectron spectroscopy (XPS) measurements with measurements of the current waveform. The XPS characterization was performed after an in-vacuum transfer of the target to avoid any oxidation or contamination. A chromium target was used for the discharge. The Ar/O2 mixture, the input power and the frequency were varied to evaluate the racetrack oxidation state in different discharge regimes. The transition from poisoned to metal mode by increasing the power can be achieved using a frequency of 20 Hz. This transition can as well be seen in the current shape of the discharge which converges to its non-reactive form. This is a first approach to investigate the assumed correlation.