München 2019 – wissenschaftliches Programm
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P: Fachverband Plasmaphysik
P 12: Plasma Surface Interaction II - Helmholtz Graduate School IV
P 12.5: Vortrag
Dienstag, 19. März 2019, 17:45–18:10, HS 20
Ga+ Sputtering of tungsten in regard to the Crystal Surface Orientation — •Karsten Schlüter1,2, Martin Balden1, Tiago Fiorini da Silva3, and Kai Nordlund4 — 1Max-Planck-Institut für Plasmaphysik, Boltzmannstr. 2, 85748 Garching, Germany — 2Fakultät für Maschinenwesen, Technische Universität München, D-85748, Garching, Germany — 3Physics Institute of University of São Paulo - Rua do Matão, trav. R 187, 05508-090 São Paulo, Brazil — 4Department of Physics, P.O. Box 43, FIN-00014 University of Helsinki, Finland
Properties like sputtering or oxidation are influenced by the crystal orientation. To investigate this effect, a measuring method is developed to study the dependency of W properties on its crystal orientation to benchmark sputtering theories and to predict the properties of textured materials.
A polycrystalline polished W sample was sputtered with a 30 keV Ga ion beam. Sequentially the crystal orientations were analyzed using electron backscatter diffraction and the height measurement was measured with a convocal laser scanning microscope.
The height information is visualized in an inverse pole figure, representing the sputter yield in all crystal orientation. The sputter yield changes more than one order of magnitude with the crystal orientation. Molecular dynamic simulations confirm the experimental results.