München 2019 – wissenschaftliches Programm
P 18.13: Poster
Donnerstag, 21. März 2019, 16:30–18:30, Foyer Audimax
Diagnostic of a Process Plasma used for the Production of Memristive Devices — •Julia Cipo1, Sven Gauter1, Felix Georg1, Finn Zahari2, Thomas Mussenbrock3, Holger Kersten1, and Hermann Kohlstedt2 — 1Plasma Technology Group, Institute of Experimental and Applied Physics, University of Kiel, Germany — 2Nanoelctronics Group, Faculty of Engineering, University of Kiel, Germany — 3Electrodynamics and Physical Electronics Group, Institute of Electrical Engineering and Information Science, BTU Cottbus-Senftenberg, Germany
The production of memristive devices received importance for non-volatile memories, neuromorphic engineering and in image processing algorithms. The intrinsic properties of these devices are determined by I-V characteristics, which are influenced by various process parameters. Since the investigated memristive films are deposited by magnetron sputtering it is important to understand the physics of the discharge. The obtained plasma parameters can be correlated with the electrical properties of the memristive films. For the plasma diagnostic we used a passive thermal probe, which can be operated simultaneously as a thermal probe for energy flux measurement and as a planar Langmuir probe for measuring the floating and plasma potentials as well as the electron temperature. In particular, we investigated the reactive sputter deposition of NbOx- layers for a grounded and a floating substrate / probe. With our results we can explain the radial variations of the electric properties and can conclude for dominating factors which have a tremendous effect on the properties of these thin films.