München 2019 – wissenschaftliches Programm
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P: Fachverband Plasmaphysik
P 18: Postersitzung
P 18.32: Poster
Donnerstag, 21. März 2019, 16:30–18:30, Foyer Audimax
Studies of an atmospheric-pressure dielectric barrier discharge in Ar-HMDSO mixtures — •D. Loffhagen1, M. M. Becker1, D. Hegemann2, B. Nisol3, S. Watson3, M. R. Wertheimer3, and C.-P. Klages4 — 1Leibniz Institute for Plasma Science and Technology, 17489 Greifswald, Germany — 2Empa, Swiss Federal Laboratories for Materials Science and Technology, Plasma & Coating Group, 9014 St. Gallen, Switzerland — 3Groupe des Couches Minces and Department of Engineering Physics, Polytechnique Montréal, Montreal QC, Canada H3C 3A7 — 4TU Braunschweig, Institute for Surface Technology, 38108 Braunschweig, Germany
Dielectric barrier discharges (DBDs) have been widely applied as a source for the deposition of organosilicon films by means of plasma-enhanced chemical vapour deposition (PECVD) processes, where hexamethyldisiloxane (HMDSO) is often used as monomer. As a result of Penning ionization processes, already small amounts of this monomer in the argon carrier gas lead to drastic changes of the discharge characteristics. In the present contribution, a large reactor for performing DBD experiments at atmospheric pressure is investigated by means of a time-dependent, spatially one-dimensional fluid model and measurements. The focus is on the electrical characteristics of discharges in argon with HMDSO admixtures in the range from 0 to 600 ppm. Results for a.c. voltage with an amplitude of about 4 kV and a frequency of 20 kHz are presented and discussed. In general, quite good agreement between modelling and measured data for the gap voltage and discharge current is found.