München 2019 – wissenschaftliches Programm

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P: Fachverband Plasmaphysik

P 6: Low Pressure Plasmas I

P 6.7: Vortrag

Montag, 18. März 2019, 18:15–18:30, HS 20

Measurements of VUV/UV photon fluxes in planar ICP discharges at low pressure — •Caecilia Fröhler1, Roland Friedl1, Stefan Briefi1,2, and Ursel Fantz1,21AG Experimentelle Plasmaphysik, Universität Augsburg, 86135 Augsburg — 2Max-Planck-Institut für Plasmaphysik, Boltzmannstr. 2, 85748 Garching

Photon fluxes in the vacuum ultraviolet spectral region (VUV, wavelength below 200 nm) and in the ultraviolet (UV, wavelength between 200  nm and 400 nm) play a role in plasma treatment processes. They can have beneficial or undesirable effects on the surface material depending on the absolute flux, the photon energy and the application. Therefore, VUV/UV photon fluxes of the gases H2, N2, O2, Ar and mixtures are investigated in a planar ICP discharge (Ø15 cm, height 10 cm; 2 MHz; ≤ 2 kW; 0.3 - 10 Pa) in pressure and power scans with a special focus on the spectral composition. For that purpose, an 1 m McPherson VUV spectrometer is used which can be equipped either with a solar-blind photomultiplier or with a windowless Channel Electron Mulitiplier. Thus, the VUV spectrometer allows measurements in the wavelength range from 50 nm to 300 nm, with an absolute intensity calibration available between 116 nm and 300 nm. Additionally, the results are compared with measurements using a VUV diode system which is under development. In contrast to the VUV spectromter, the diode system is small, portable and its absolute intensity calibration does not depend on the plasma setup of use.

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