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Regensburg 2019 – wissenschaftliches Programm

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CPP: Fachverband Chemische Physik und Polymerphysik

CPP 58: Nanostructures, Nanostructuring and Nanosized Soft Matter

CPP 58.2: Vortrag

Donnerstag, 4. April 2019, 15:30–15:45, H13

The real 3D morphology of cylindrical block copolymer nanomasks — •Daniel Kool1,2, Katharina Brassat1,2, and Jörg K. N. Lindner1,21University of Paderborn, Dept. of physics, Paderborn, Germany — 2Center for Optoelectronics and Photonics Paderborn CeOPP, Paderborn, Germany

Block copolymer (BCP) lithography is a well-established technique which allows for economical large-area patterning of surfaces with self-assembled nanoscale features. We exploit the microphase separation of copolymers, here poly(styrene-b-methyl methacrylate) (PS-b-PMMA) BCP with a block length ratio of 70:30. This results in the formation of 17 nm diameter PMMA cylinders perpendicular to the surface and hexagonally arranged in a PS matrix. After selective removal of PMMA cylinders the nanostructured PS thin film can be used in common lithography processing steps, as reactive ion etching and lift-off for pattern replication and transfer. Here we demonstrate that the efficiency of replication of the nanostructured features can be drastically improved by modification of the polymer mask prior to lithographic use by an O2 plasma treatment. We achieved an experimental method of pattern replication without loss of features and the opportunity to tune the feature size precisely on the nanometer scale. By SEM investigations of both interfaces of the lithography mask we were able to reconstruct the 3-dimensional morphology of the polymer mask. Indirect information on the polymer mask morphology is obtained, in addition, from pattern replication studies by lift-off experiments and by RIE, allows to conclude on the real 3D shape of BCP pores.

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