Regensburg 2019 – wissenschaftliches Programm
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DS: Fachverband Dünne Schichten
DS 15: Focus Session: Direct-Write Nanofabrication and Applications I
(Electron Beam Induced Processing) (joint session DS/TT)
DS 15.5: Vortrag
Mittwoch, 3. April 2019, 10:45–11:00, H32
Fabrication of Photonic and Optomechanics Devices in hBN by Electron Beam Induced Etching — •Johannes Froech1, Sejeong Kim1, Prasoon Shandilya2, Bishnupada Behera2, Chris Healy2, James Bishop1, Matthew Mitchell2, David Lake2, Paul Barclay2, Igor Aharonovich1, and Milos Toth1 — 1University of Technology Sydney, Ultimo, NSW, 2007, Australia — 2University of Calgary, Calgary, AB, T2N 1N4, Canada
Exceptional efforts have been undertaken in recent years to identify suitable platforms for solid state quantum photonic technologies. Several schemes exploit materials that typically host on-demand single photon emitters and can be easily processed in a robust and reliable manner to yield functional nanostructures. A potential material for applications in this field is hexagonal Boron Nitride (hBN), based on the discovery of room-temperature, stable, ultra-bright quantum emitters. However, until recently, fabrication of complex hBN geometries was not viable. Here, we demonstrate new processing approachess for the fabrication of complex photonic and optomechanics nanostructrues in suspended hBN and hBN/ Si hybrid systems using the technique of Electron Beam Induced Etching (EBIE). It is minimally invasive and allows for post fabrication editing to tune optical properties. In combined systems, the etching technique is highly selective and allows for precise and maskless fabrication. Overall, our methodology and results set the foundation for cavity quantum electrodynamics experiments and further work in integrated optomechanics systems to be performed utilizing hBN quantum emitters.