Regensburg 2019 – wissenschaftliches Programm
DS 19: Focus Session: Direct-Write Nanofabrication and Applications II
(Electron Beam Induced Processing) (joint session DS/TT)
DS 19.3: Vortrag
Mittwoch, 3. April 2019, 15:45–16:00, H32
Non-classical Liquid Metal Ion Sources for advanced FIB nano-patterning — •Paul Mazarov1, Lothar Bischoff2, Wolfgang Pilz2, Nico Klingner2, Achim Nadzeyka1, Jorg Stodolka1, and Jacques Gierak3 — 1Raith GmbH, Konrad-Adenauer-Allee 8, 44263 Dortmund, Germany — 2Helmholtz-Zentrum Dresden-Rossendorf, Institute of Ion Beam Physics and Materials Research, Bautzner Landstrasse 400, 01328 Dresden, Germany — 3LPN-CNRS, Route de Nozay, 91460 Marcoussis, France
Focused Ion Beam (FIB) processing has been developed into a well-established and still promising technique for direct patterning and proto-typing on the nm scale. Exploring the Liquid Metal Alloy Ion Sources (LMAIS) potential represents a promising alternative to expand the global FIB application fields. Especially, ion beam nanofabrication as direct, resistless and three-dimensional patterning enables a simultaneous in-situ process control by cross-sectioning and inspection. Thanks to this, nearly half of the elements of the periodic table are made available in the FIB technology as a result of continuous research in this area during the last forty years. Recent developments could make these sources to an alternative technology feasible for nano-patterning challenges. In this contribution the operation principle, the preparation and testing process as well as prospective domains for modern FIB applications will be presented. As an example we will introduce a Ga35Bi60Li5 LMAIS in detail. It enables high resolution imaging with light Li ions and sample modification with Ga or heavy polyatomic Bi clusters, all coming from one ion source.