Regensburg 2019 – wissenschaftliches Programm

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DS: Fachverband Dünne Schichten

DS 22: Thin Film Applications

Donnerstag, 4. April 2019, 09:30–12:15, H39

  09:30 DS 22.1 The contribution has been withdrawn.
09:45 DS 22.2 Electrical and optical characterization of the correlated metals AMoO3 (A = Ca, Sr, Ba) — •Mahdad Mohammadi, Aldin Radetinac, Iliya Radulov, Leopold Diop, Philipp Komissinskiy, and Lambert Alff
10:00 DS 22.3 Enhancing Performance of Sputter Deposited Photocatalytic Thin FilmsSalih Veziroglu, Muhammad Zubair Ghori, Bodo Henkel, Alexander Vahl, Oleksandr Polonskyi, Thomas Strunskus, •Oral Cenk Aktas, and Franz Faupel
10:15 DS 22.4 Novel deposition approach of MoS2 thin films for hydrogen evaluation reaction — •Talha Nisar, Torsten Balster, Francis Oliver Vinay Gomes, and Veit Wagner
10:30 DS 22.5 Noise properties of oxygen engineered HfO2−x based Resistive Random Access Memory devices — •Eszter Piros, Martin Lonsky, Stefan Petzold, Eric Jalaguier, Emmanuel Nolot, Christelle Charpin, Jens Müller, and Lambert Alff
  10:45 15 min. break.
11:00 DS 22.6 High resolution fast X-ray reflectivity data acquisition — •Milena Lippmann, Anita Ehnes, and Oliver Seeck
  11:15 DS 22.7 The contribution has been withdrawn.
11:30 DS 22.8 Microfabricated switchable THz flat lenses made out of VO2 thin films — •Florian Kuhl, Angelika Polity, Yan Zhang, and Peter J. Klar
11:45 DS 22.9 Investigations of the physical properties of lithium-based solid electrolyte thin films in the system Li-P-S-O-N — •Fabian Michel, Martin Becker, Jürgen Janek, and Angelika Polity
  12:00 DS 22.10 The contribution has been withdrawn (duplicate of HL 4.3).
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DPG-Physik > DPG-Verhandlungen > 2019 > Regensburg