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HL: Fachverband Halbleiterphysik

HL 45: HL Posters III

HL 45.50: Poster

Donnerstag, 4. April 2019, 18:30–21:00, Poster E

Structural, electrical and optical properties of W_xMo_1−xO₃ thin films fabricated by pulsed laser deposition — •Peter Schlupp, Holger von Wenckstern, and Marius Grundmann — Universität Leipzig, Felix-Bloch-Institut für Festkörperphysik, Leipzig, Germany

To reduce the energy consumption of buildings, controlled reduction of the energy flow through the glazing is a promising option. Electrochromic coatings on the windows can be used to switch the light flow within minutes blocking light from outside (summer) or repelling light from inside the building (winter). Today, oxide based materials, especially tungsten oxide thin films, are often used [1]. Alloying WO₃ with MoO₃ can enhance the electrochromic properties [2]. Using pulsed laser deposition (PLD), it is possible to fabricate material libraries using a segmented target [3].

We present W_xMo_1−xO₃ thin films with a continuous composition spread grown by PLD. Crystalline structure investigated by X-ray diffraction, electrical properties determined by Hall-effect measurements and optical properties from transmission and reflection measurements in dependence on the cation ratio will be presented. The properties of an electrochromic cell, with W_xMo_1−xO₃ as cathodic and NiO as anodic material will be discussed.

References

[1] Granqvist et al., Electrochimica Acta 259, 1170 (2018)

[2] Lin et al., Thin Solid Films 584, 341 (2015)

[3] von Wenckstern et al., CrystEngComm 15, 10020 (2013)