Regensburg 2019 – wissenschaftliches Programm
O 12.9: Vortrag
Montag, 1. April 2019, 17:15–17:30, H15
Nanostructuring new optical materials using BCML and RIE methods — •Louise Kaeswurm, Zhaolu Diao, Klaus Weishaupt, and Joachim Spatz — Max-Planck-Institute for Medical Research, Department of Cellular Biophysics, Jahnstr. 29, 69120 Heidelberg
To improve the optical properties of silica glass, moth-eye inspired nanostructures etched into the surface of silica glass have shown promising results in reducing the reflectance and increasing the transmittance over 99.5 %. To create these moth-eye structures, an etching mask is applied to the sample via micellar block copolymer lithography (BCML) and pillars are etched into the substrate in a reactive ion etching process.
With this method the performance for a rather large spectral range is increased and the effect is not restricted to a small angular range. Since many other glasses and materials would also profit from such a treatment, current research is focused on the transfer of these techniques to other materials, for example, etching these nanostructures into sapphire, diamond or borosilicate glass. One challenge of these new materials is finding a way to etch very hard or chemically inert structures or irregular structures such as found in borosilicate glass. For this, new etching procedures had to be developed. Another challenge is the cleaning of the substrates without destroying the fragile nanostructure. Here, common ultrasonic cleaning methods did not give convenient results and therefore, megasonic cleaning was tested and optimized.