Regensburg 2019 – wissenschaftliches Programm
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O: Fachverband Oberflächenphysik
O 37: Metal Oxide Surfaces II: Structure, Epitaxy and Growth
O 37.7: Vortrag
Dienstag, 2. April 2019, 15:30–15:45, H16
Surface reconstructions on VO2(110) — •Jon-Olaf Krisponeit1, Simon Fischer1, Jan Ingo Flege1,2, and Jens Falta1 — 1Institute of Solid State Physics, University of Bremen, Germany — 2Applied Physics and Semiconductor Spectroscopy, BTU Cottbus, Germany
Vanadium dioxide features a pronounced metal-insulator transition at 340 K. For thin films, this transition is adjustable via substrate-induced strain, making VO2 highly attractive for oxide electronic applications like switching devices and sensors. In addition, VO2 is considered for smart coatings and as catalytic material. For such applicational efforts, a thorough understanding of the relevant surfaces is an important prerequisite.
Among the low-indexed surfaces orientations of VO2, the (110) surface is energetically favorable. We have prepared VO2(110) thin films by means of reactive molecular beam epitaxy on two different substrate types: TiO2(110) single crystals as well as on RuO2(110) islands grown on Ru(0001) crystals. The film stoichiometry was confirmed via XPS, while the surface structure was investigated by µLEED. For both substrate types diffraction patterns of three distinct symmetries have been observed in dependence on temperature. The corresponding surface reconstructions will be discussed in terms of surface oxygen content.
Financial support from the DFG and the Institutional Strategy of the University of Bremen, funded by the German Excellence Initiative, is acknowledged.