Regensburg 2019 – wissenschaftliches Programm
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O: Fachverband Oberflächenphysik
O 46: Poster Tuesday: Plasmonics and Nanooptics
O 46.6: Poster
Dienstag, 2. April 2019, 18:00–20:00, Poster D
Localization of photonic modes in optimised disordered amorphous silicon thin films — •Felix Becker2, Martin Aeschlimann1, Tobias Brixner3, Benjamin Frisch1, Michael Hartelt1, Matthias Hensen3, Thomas H Loeber4, Walter Pfeiffer2, Sebastian Pres3, Bernd Stannowski5, and Helmut Stiebig2 — 1Fachbereich Physik and Research Center OPTIMAS, TU Kaiserslautern, Erwin-Schrödinger-Str. 46, 67663 Kaiserslautern — 2Fakultät für Physik, Universität Bielefeld, Universitätsstr. 25, 33615 Bielefeld — 3Institut für Physikalische und Theoretische Chemie, Universität Würzburg, Am Hubland, 97074 Würzburg — 4Nano-Structuring-Center, Erwin-Schrödinger-Str. 13, 67663 Kaiserslautern — 5Helmholtz-Zentrum Berlin, PVcomB, Schwarzschildstr. 3, 12489 Berlin
Tailored disordered nanostructures that feature long-living photonic modes are employed to enhance local light scattering, light localization, and absorption. We demonstrate the controlled fabrication of nanotextured a-Si:H absorber layers using focused ion beam milling of planar ZnOx substrates and PECVD. This allows studying the light absorption in nanotextured absorber layers with custom designed topographies. Light trapping and absorption in these samples is investigated by time- and energy-resolved PEEM. The obtained map of photonic modes and absorption patterns agrees well with FTDT simulations. We demonstrate enhanced light localization in tailored disordered absorbers and demonstrate a new strategy to further optimize light trapping.