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Regensburg 2019 – wissenschaftliches Programm

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O: Fachverband Oberflächenphysik

O 63: Poster Wednesday: Ultrafast Processes

Mittwoch, 3. April 2019, 17:45–20:00, Poster B1

17:45 O 63.1 Electron dynamics in MoS2 after resonant optical excitation probed with different light polarizations — •Lasse Münster, Robert Wallauer, Johannes Reimann, Jens Güdde, and Ulrich Höfer
17:45 O 63.2 Quenching of charge density wave states in ultrafast transmission electron microscopy — •Till Domröse, Thomas Danz, and Claus Ropers
17:45 O 63.3 Energy-resolved measurement and simulation of hot electron transport in Au/Fe/MgO(001) — •Jan Beckord, Yasin Beyazit, John Thomas, Ping Zhou, Detlef Diesing, Uwe Bovensiepen, and Manuel Ligges
17:45 O 63.4 Ultrafast miniaturised pulsed electron gun for time-resolved LEED — •Dennis Epp, Gero Storeck, Max Lukas Kroll, Murat Sivis, and Claus Ropers
17:45 O 63.5 Towards time resolved photoemission spectroscopy using a circularly polarized fs-XUV light source — •Pascale Klaeger, Sebastian Emmerich, Jonas Hoefer, Sebastian Hedwig, Johannes Stöckl, Benito Arnoldi, Ofer Kfir, Claus Ropers, Benjamin Stadtmüller, and Martin Aeschlimann
17:45 O 63.6 Oscillating kinetic energy in time-resolved photoemission — •Xinwei Zheng, Kamil Bobowski, Dominic Lawrenz, Robert Carley, Beatrice Andres, Cephise Cacho, Richard Chapman, Emma Springate, Serguei Molodtsov, and Martin Weinelt
17:45 O 63.7 Surface motion of femtosecond-laser excited silicon filmsTobias Zier, •Marie Kempkes, Sabrina Schuster, Lukas Nöding, J. Gaudin, P. Martinez, V. Blanchet, D. Descamps, S. Petit, A. Lévy, and Martin E. Garcia
17:45 O 63.8 Electron-Phonon coupling in non-equilibrium: tr-RHEED on few monolayer Pb/Si(111) films — •Tobias Witte, Bernd Hafke, Christian Brand, and Michael Horn-von Hoegen
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