Regensburg 2019 – wissenschaftliches Programm
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O: Fachverband Oberflächenphysik
O 68: Poster Wednesday: Nanostructures
O 68.3: Poster
Mittwoch, 3. April 2019, 17:45–20:00, Poster B2
Cluster-surface interaction of plasmonic silver particles on silicon — •Katharina Engster1, Kevin Oldenburg1, Jean Lermé2, Sylvia Speller1, and Ingo Barke1 — 1University of Rostock, Institute of Physics, 18059 Rostock, Germany — 2Université de Lyon, Institut Lumière Matière, 69622 Villeurbanne Cedex, France
Plasmonic nanoparticles interact with semiconductor surfaces in various ways. On the one hand the plasmon resonance is highly sensitive to the polarizable substrate on an atomic scale [1]. On the other hand plasmonically enhanced excitation of electron-hole pairs is expected to give rise to spatial variations of surface photovoltages (SPV), unless metallic surface states result in equilibration of the surface potential [2]. For size-selected Ag nanoparticles deposited on silicon we show that photoemission electron microscopy (PEEM) enables precise quantification of the SPV based on the spectrally resolved electron yield. The role of the plasmon resonance energy of individual particles, the detailed properties of the substrate (doping, surface states), and effects induced by the experimental setup are being discussed.
[1] K. Oldenburg et al., under review.
[2] K. Sell et al., Phys. Status Solidi B 247, 1087-1094 (2010).