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Regensburg 2019 – wissenschaftliches Programm

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O: Fachverband Oberflächenphysik

O 76: Plasmonics & Nanooptics V: Nanostructures and Nanoantennae

O 76.2: Vortrag

Donnerstag, 4. April 2019, 10:45–11:00, H8

Fabrication of Plasmonic Nanostructures by He+ and Ga+ Milling — •Michael Westphal1, Sven Stephan2, Vladimir Smirnov2, Daniel Emmrich1, Henning Vieker1, Andre Beyer1, Martin Silies2, and Armin Gölzhäuser11Bielefeld University, Germany — 2Oldenburg University, Germany

Plasmonic nanostructures are essential for controlling and directing light on the nanoscale. While fabrication techniques like standard electron beam lithography (EBL) methods or focused ion beam (FIB) milling with Ga+ ions are approaching their limit in the 10-nm-regime, ion beam milling with He+ ions is capable of milling features below 6 nm [1]. We will show a combined approach using a Ga+ FIB for milling large features and employing the fine resolution of the helium ion microscope (HIM) for milling small features. We will discuss different patterning strategies to optimize the writing speed and minimize substrate swelling. In addition, the problem of quantifying the sizes of milled gaps will be addressed and an automated, reproducible approach for measuring the size of written features will be demonstrated.

[1] H. Kollmann et al., Nano Letters. 14, 4778-4784 (2014).

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