SKM 2021 – wissenschaftliches Programm
CPP 3.3: Vortrag
Montag, 27. September 2021, 14:15–14:30, H3
New nanoscale gradient copolymer films fabricated via initiated chemical vapor deposition (iCVD) — •Stefan Schröder, Alexander M. Hinz, Oleksandr Polonskyi, Thomas Strunskus, and Franz Faupel — Kiel University, Institute for Materials Science, 24143 Kiel, Germany
Many structures found in the natural world are based on organic gradients. To reproduce these structures, polymers are an excellent choice, as they also enable the formation of gradient copolymers. This study reports on the fabrication of such gradient copolymers in the form of thin films via initiated chemical vapor deposition (iCVD). Solvent-free deposition and the mild deposition conditions are only two of the advantages of iCVD in order to produce high-quality polymer thin films on large-area substrates, complex geometries as well as temperature-sensitive samples. In addition, the process enables the combination of comonomers which typically lack a common solvent. For the transfer of the gradient film approach to the lower nanoscale, a detailed understanding and control of the vapor phase kinetics are required. This is solved in this study by a novel in-situ quadrupole mass spectrometry (QMS) extension combined with supporting ab-initio/density functional theory (DFT) calculations. It offers a better insight into the underlying reaction kinetics and enables enhances process control during the deposition. This facilitates the fabrication of gradient copolymer films with film thicknesses below 30 nm. They show completly new physical and chemical properties, which cannot be obtained with materials currently in use.