SKM 2021 – wissenschaftliches Programm
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HL: Fachverband Halbleiterphysik
HL 19: Poster Session IV
HL 19.20: Poster
Donnerstag, 30. September 2021, 13:30–16:30, P
Tuning the electrochemical properties of multifunctional catalyst layers by plasma-enhanced atomic layer deposition — •Matthias Kuhl, Alex Henning, Lukas Haller, Laura Wagner, Chang-Ming Jiang, Verena Streibel, Ian D. Sharp, and Johanna Eichhorn — Walter Schottky Institut, Technische Universität München
Major challenges in photoelectrochemical (PEC) energy conversion systems are the poor efficiency and material instability of semiconductor photoelectrodes under the harsh operating conditions. Recently, it was demonstrated that plasma-enhanced atomic layer deposition (PE-ALD) can be used to fabricate conformal, biphasic Co3O4/Co(OH)2 catalyst layers on semiconductor photoelectrodes, which are simultaneously robust and electrochemically active. The nanocrystalline Co3O4 layer forms a durable interface to the substrate and the disordered Co(OH)2 surface layer significantly improves the electrocatalytic oxygen evolution reaction (OER) activity.
Here, we leverage the precise control of PE-ALD to further tailor the thickness ratio of the surface and interface layers of the Co3O4/Co(OH)2 bilayer by tuning the plasma exposure time during growth. Short pulses lead to the formation of porous, unstable, catalytically active Co(OH)2 layers due to an incomplete precursor decomposition, while long pulses result in denser films and form stable, inactive Co3O4 layers. More generally, this work highlights the power of PE-ALD for engineering catalyst/semiconductor interfaces simultaneously exhibiting multiple functionalities.