SMuK 2021 – wissenschaftliches Programm
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P: Fachverband Plasmaphysik
P 1: Low Pressure Plasma Sources I
P 1.1: Hauptvortrag
Montag, 30. August 2021, 11:00–11:30, H5
Diagnostics of magnetized high frequency technological plasmas — •Julian Schulze1, Moritz Oberberg1, Birk Berger1, Julian Roggendorf1, Dennis Engel2, Christian Wölfel3, Jan Lunze3, Ralf Peter Brinkmann2, and Peter Awakowicz1 — 1Institute of Electrical Engineering and Plasma Technology, Ruhr-University Bochum — 2Institute of Theoretical Electrical Engineering, Ruhr-University Bochum — 3Institute of Automation and Computer Control, Ruhr-University
Capacitively coupled radio frequency magnetrons are frequently used for sputter deposition of ceramic layers. Many fundamentals of their operation are not understood. We characterize such a discharge operated in argon with oxygen admixture at low pressure by a synergistic combination of different diagnostics and find that the magnetron magnetic field induces a discharge asymmetry. This Magnetic Asymmetry Effect affects the DC self bias and ion flux-energy distributions functions at boundary surfaces, which can be controlled by adjusting the magnetic field. Tuning the magnetic field allows to magnetically control the self-excitation of plasma series resonance oscillations of the RF current and, thus, Non-Linear Electron Resonance Heating. PROES reveals space and time resolved insights into the dynamics of the electron power absorption in the presence of the magnetic field. Measurements are also performed as a function of the oxygen admixture to understand the plasma behavior during sputter applications that are affected by hysteresis effects. In parallel the deposition rate and composition of the deposited thin films are determined.