SKM 2023 – wissenschaftliches Programm
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DS: Fachverband Dünne Schichten
DS 12: Poster
DS 12.10: Poster
Mittwoch, 29. März 2023, 17:00–19:00, P3
Fabrication of copper halide thin films by combinatorial PLD — •Christopher Walter, Felix-Florian Delatowski, Michael Bar, Holger von Wenckstern, and Marius Grundmann — Universität Leipzig, Felix Bloch Institute for Solid State Physics, Semiconductor Physics Group, Leipzig, Germany
Copper halides are promising p-type materials for transparent device applications due to their large direct band gaps (Eg=3−3.4 eV) [1]. Here we present the deposition of copper halide thin films by combinatorial pulsed laser deposition (PLD) and discuss their structural, morphological and optical properties as a function of different growth parameters [2]. At ambient conditions, CuI crystallizes in the cubic zinc-blende structure. XRD shows <111>-orientation for CuI independent from the used substrate material. CuBr and CuCl grow polycrystalline with the same crystal structure as CuI. However, with the incorporation of low iodine concentration, the crystallinity improves significantly. We find that the thin films exhibit very smooth surfaces with a roughness of RRMS=0.8−1.6 nm for the binary CuI, CuBr and CuCl systems under optimal parameters. Furthermore, using combinatorial PLD and a segmented target with one segment each of CuBr and CuI, ternary CuBrxI1−x alloys were grown. Based on the resulting locally varying composition, the influence on structural and optical properties can be directly observed.
[1] M. Grundmann et al. : phys. stat. sol. (a) 210, 9, 1671 (2013)
[2] H. von Wenckstern et al. : phys. stat. sol. (b) 257, 7, 1900626 (2019)