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HL: Fachverband Halbleiterphysik

HL 10: Focus Session: Progress in Hybrid Phononic Quantum Technologies II

HL 10.6: Talk

Monday, March 27, 2023, 17:15–17:30, POT 151

Dry processing of high Q 3C-silicon carbide nanostring resonators — •Felix David, Philipp Bredol, Eva Weig, and Yannick Klaß — Technical University of Munich, Chair of Nano and Quantum Sensors, 85748 Munich, Germany

We fabricate string resonators from strongly stressed 3C-silicon carbide (SiC) grown on a silicon substrate. In the conventional fabrication process, we do electron-beam lithography with PMMA to define a metallic hard mask for the subsequent dry-etching step via a liftoff process. This requires some wet-chemical process steps, which can destroy our samples. Here we describe an alternative process, which avoids all wet-chemical process steps to enable superior quality. It involves the use of a negative electron-beam resist as an etch mask, as well as the completely reactive-ion etching-based release of the nanostrings. The dry-processed nanostrings can be fabricated with a high yield and exhibit high mechanical quality factors at room temperature.