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HL: Fachverband Halbleiterphysik

HL 7: Poster I

HL 7.3: Poster

Monday, March 27, 2023, 13:00–15:00, P2/EG

Atomic layer deposition of iron titanate for use as a photoanode — •Nina Miller^1,2, Ryan Kisslinger^1,2, and Ian Sharp^1,2 — ¹Walter Schottky Institut Technical University of Munich — ²Physics Department, TUM School of Natural Sciences, Technical University of Munich, Garching, Germany

TiO₂ is of significant importance in the field of energy research. However, to develop it for artificial photosynthesis, the band gap of TiO₂, which is 3.2 eV and consequently absorbs only ultraviolet light, must be paired with a material capable of absorbing visible light. Here, we experimentally explore the effect of depositing thin films of hematite (α - Fe₂O₃) on nanostructured TiO₂ using atomic layer deposition, with a further high-temperature annealing step to produce visible-light absorbing iron titanate (Fe₂TiO₅). Iron titanate may allow enhance charge transfer at the photoanode surface, and serve as a visible light absorbing layer. Furthermore, the TiO₂ nanotube arrays used as the substrate during atomic layer deposition can orthogonalize light absorption with respect to charge separation, leading to enhanced photocatalytic conversion during solar water splitting.