SKM 2023 – wissenschaftliches Programm

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MA: Fachverband Magnetismus

MA 31: Functional Antiferromagnetism II

MA 31.7: Vortrag

Mittwoch, 29. März 2023, 16:45–17:00, HSZ 04

Flexomagnetism and vertically graded Néel temperature of antiferromagnetic Cr₂O₃ thin films — •Pavlo Makushko¹, Tobias Kosub¹, Oleksandr Pylypovskyi¹, Natascha Hedrich², Jiang Li¹, Alexej Pashkin¹, Stanislav Avdoshenko³, René Hübner¹, Fabian Ganss¹, Daniel Wolf³, Axel Lubk^3,4, Maciej Oskar Liedke¹, Maik Butterling¹, Andreas Wagner¹, Kai Wagner², Brendan Shields², Paul Lehmann², Igor Veremchuk¹, Jürgen Fassbender¹, Patrick Maletinsky², and Denys Makarov¹ — ¹HZDR, Dresden, Germany — ²University of Basel, Basel, Switzerland. — ³IFW Dresden, Dresden, Germany — ⁴TU Dresden, Dresden, Germany.

Thin films of antiferromagnetic insulators are a prospective material platform for magnonics, spin superfluidity, THz spintronics, and non-volatile data storage. Here, we explore the presence of flexomagnetic effects in epitaxial Cr₂O₃ [1]. We demonstrate that a gradient of mechanical strain affects the order-disorder magnetic phase transition, resulting in the distribution of the Néel temperature along the thickness of a Cr₂O₃ film. The inhomogeneous reduction of the antiferromagnetic order parameter induces a flexomagnetic coefficient of about 15µB nm⁻². The antiferromagnetic ordering in the strained films can persist up to 100^∘C, rendering Cr₂O₃ as a prospective material for industrial electronics applications.

[1] P. Makushko et al., Nat Commun 13, 6745 (2022).