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O: Fachverband Oberflächenphysik
O 13: Focus Session: Ion Beam Interaction with Surfaces and 2D Materials II
O 13.3: Talk
Monday, March 27, 2023, 15:45–16:00, GER 38
Sputtering from Sinusoidal Surfaces: Monte Carlo Simulations and Comparison to Analytical Results — •Gerhard Hobler1 and R Mark Bradley2 — 1Institute of Solid-State Electronics, TU Wien, AUSTRIA — 2Departments of Physics and Mathematics, Colorado State University, Fort Collins, CO 80523, USA
Sputtered surfaces are virtually never planar at the nanoscale, and so there has been longstanding interest in the spatially averaged sputter yield Ȳ that results when a broad ion beam is incident on a surface with a nontrivial morphology. Considering the simple case of sinusoidal surfaces, the aim of the present study is (i) to investigate the contributions of redeposition and secondary sputtering to Ȳ, and (ii) to test a recently developed theory [1] that predicts Ȳ for small amplitudes from the angular dependent sputter yield of a flat surface. For the simulations we use the Monte Carlo binary collision code IMSIL [2]. Apart from expected results on redeposition and sputtering by reflected ions, we also find that sputtering by recoils that are sputtered and then strike the surface may compensate for a sizable amount of redeposition. The simulations confirm the theory’s prediction that Ȳ may either increase or decrease with amplitude depending on the incidence angle. They also confirm the theory’s prediction that redeposition scales with the square of the amplitude over the wavelength, and are generally in excellent quantitative agreement with theory.
[1] R.M. Bradley, G. Hobler, submitted for publication.
[2] G. Hobler, Nucl. Instrum. Meth. B 96 (1995) 155.