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O: Fachverband Oberflächenphysik
O 18: Poster: 2D Materials I
O 18.1: Poster
Monday, March 27, 2023, 18:00–20:00, P2/EG
CVD growth of 2D transition metal dichalcogenides for electronics and optoelectronics — •Seung Heon Han1, Ziyang Gan1, Emad Najafidehaghani1, Julian Picker1, Christof Neumann1, Uwe Hübner2, Antony George1, and Andrey Turchanin1 — 1Institute of Physical Chemistry, Friedrich Schiller University Jena, Jena, Germany — 2Leibniz Institute of Photonic Technology (IPHT), Jena, Germany
Two-dimensional (2D) transition metal dichalcogenides (TMDs) are of great interest for fundamental science and technology due to their exceptional electronic and photonic properties. Chemical vapor deposition (CVD) is a viable method for scalable growth of high-quality monolayer TMDs on various substrates and with tailored properties. Here, we present some of our recent research results on the CVD growth of 2D TMDs including monolayer single-crystal TMDs, atomically sharp TMD1-TMD2 lateral heterostructure, and TMD1-TMD2 lateral heterostructure alloys. Moreover, we demonstrate various exciting applications of these monolayers in field-effect transistors, high-performance photodetectors and memtransistors.