SKM 2023 – wissenschaftliches Programm
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TT: Fachverband Tiefe Temperaturen
TT 53: Graphene
TT 53.9: Vortrag
Donnerstag, 30. März 2023, 17:15–17:30, HSZ 204
Multi-layered atomic relaxation in van der Waals heterostructures — Dorri Halbertal1, •Lennart Klebl2, Valerie Hsieh1, Jacob Cook3, Stephen Carr4, Guang Bian3, Cory Dean1, Dante M. Kennes5,6, and Dmitri N. Basov1 — 1Department of Physics, Columbia University, United States — 21st Institute of Theoretical Physics, University of Hamburg, Germany — 3Department of Physics and Astronomy, University of Missouri, United States — 4Physics Department, Brown University, United States — 5Institut für Theorie der Statistischen Physik, RWTH Aachen University, Germany — 6Max Planck Institute for the Structure and Dynamics of Matter, Hamburg, Germany
When two-dimensional van der Waals materials are stacked to build heterostructures, Moiré patterns emerge from twisted interfaces or from mismatch in lattice constant of individual layers. Relaxation of the atomic positions is a direct, generic consequence of the Moiré pattern, with many implications for the physical properties. Motivated by experimental findings in multi-layered van der Waals heterostructures, we develop a generic continuum approach to model (multi-layered) relaxation processes based on the generalized stacking fault energy functional. The continuum property of the approach enables us to access large scale regimes and achieve agreement with experimental findings. Furthermore, we study the impact of multi-layered relaxation on the local density of states of a twisted graphitic system. We identify measurable implications for the system, experimentally accessible by scanning tunneling microscopy.