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K: Fachverband Kurzzeit- und angewandte Laserphysik
K 1: Laser Applications and Laser-Beam Material Interaction
K 1.3: Vortrag
Dienstag, 21. März 2023, 11:50–12:05, HSZ/0403
Laser-assisted atmospheric pressure plasma jet etching of optical glasses — •Robert Heinke1,2, Martin Ehrhardt1, Pierre Lorenz1, Thomas Arnold1,2, and Klaus Zimmer1 — 1Leibniz Institute of Surface Engineering, Permoserstr. 15, Leipzig, 04318, Germany — 2Institute of Manufacturing Science and Engineering, Technische Universitat Dresden, 01062 Dresden, Germany
The increasingly demanding requirements for high-performance optics, e.g. EUV and free-form optics, necessitate progressive improvements in manufacturing techniques. Atmospheric pressure plasma jet (APPJ) processing provides a tool for the generation and correction of highly precise optical surfaces due to its high flexibility and depth precision. During APPJ processing of optical glasses such as N-BK7 and N-SF6, a residual layer of nonvolatile compounds is formed, resulting in rough surfaces or even the abortion of the etching process. Lasers are utilized to remove the residual layer without damaging the glass underneath. Therefore, a 248 nm excimer laser was used and fluences as well as pulse numbers have been varied to determine a parameter set with optimum selectivity. The resultant surface structures were measured by WLI and SEM. The results show a strong dependence on the processed glass type and the residual layer thickness. The incorporation of laser ablation into APPJ etching provides higher etching rates and lower surface roughness.