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Berlin 2024 – wissenschaftliches Programm

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O: Fachverband Oberflächenphysik

O 17: Semiconductor Substrates II: Structure, Epitaxy, Growth

Montag, 18. März 2024, 15:00–17:00, MA 144

15:00 O 17.1 Bimodal Growth of Fe islands on graphene — •Yisheng Gu
15:15 O 17.2 Local GaAs growth on patterned Si(001) surfaces by Laser-assisted MOVPE — •Christian Bruckmann, Jürgen Bläsing, Armin Dadgar, and André Strittmatter
15:30 O 17.3 Growth of vanadium on Si(111) — •Dang Liu
15:45 O 17.4 In-situ analysis of phase transitions in ultrathin nickel silicides by time-of-flight medium energy ion scattering — •Carolin Frank, Kevin Vomschee, Radek Holeňák, Eleni Ntemou, and Daniel Primetzhofer
  16:00 O 17.5 The contribution has been withdrawn.
16:15 O 17.6 Atomic structure of As-modified Si(100) surfaces prepared in MOCVD ambience utilizing background arsenic — Chris Yannick Bohlemann, Agnieszka Paszuk, Manali Nandy, Aaron Flötotto, Max Großmann, Oleksandr Romanyuk, •Kai Daniel Hanke, Peter Kleinschmidt, Erich Runge, and Thomas Hannappel
16:30 O 17.7 Towards an ab initio kinetic Monte Carlo model for the growth of β-Ga 2 O 3 (100) — •Qaem Hassanzada, Konstantin Lion, Claudia Draxl, and Matthias Scheffler
  16:45 O 17.8 The contribution has been withdrawn.
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