Bereiche | Tage | Auswahl | Suche | Aktualisierungen | Downloads | Hilfe

DS: Fachverband Dünne Schichten

DS 2: Layer Deposition

DS 2.2: Vortrag

Montag, 17. März 2025, 09:45–10:00, H14

Enabling vacuum process monitoring with time-of-flight spectroscopy — •Marco John, Kristian Kirsch, Andreas Trützschler, Christoph Bartlitz, Marcel Herrmann, and Klaus Bergner — VACOM Vakuum Komponenten & Messtechnik GmbH, Großlöbichau, Germany

A crucial aspect to manage industrial vacuum processes is the importance of fast in-situ monitoring and control of process parameters such as pressure and residual gas composition. Improving process control in this way minimizes production errors, avoids damage to process equipment and ensures longer operating times. The capabilities of hot cathodes and quadrupole mass spectrometers are limited for this complex task, as they can only measure either the total pressure or the gas composition. One answer to this challenge is our novel ion source NOVION*, which combines the well-known technology of time-of-flight spectroscopy with our patented ion trap to an industrially available gas analyzing application.

In this talk we present the fundamental physical principles of the novel ion source and explain the compact combination of time-of-flight spectroscopy with our own patented ion trap. We discuss the advantages and limits in different applications as well as best practices in the field and show the capability to push the principle to its limits at high pressures without compromising the performance or lifetime of the filaments.

Keywords: process monitoring; time of flight spectroscopy; residual gas analysis; NOVION