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CPP: Fachverband Chemische Physik und Polymerphysik

CPP 17: Poster I

CPP 17.48: Poster

Montag, 9. März 2026, 19:00–21:00, P5

Designing functional polymer surfaces by initiated chemical vapor deposition — •Stefan Schröder, Lynn Schwäke, Tobias Giez, Thomas Strunskus, Franz Faupel, and Tayebeh Ameri — Kiel University, Kiel, Germany

Polymer thin films and organic surfaces have attracted significant interest across diverse application areas, ranging from wearable electronics to biomedicine and encapsulation. The demand for new functional surfaces, combined with ongoing device miniaturization, requires defect-free nanoscale polymer films with precise control over thickness and chemistry. Chemical vapor deposition (CVD) of polymer surfaces addresses these challenges by eliminating the dewetting and surface tension effects commonly encountered in conventional solution-based thin film fabrication. In particular, initiated chemical vapor deposition (iCVD) enables the fabrication of conformal polymer coatings with nanoscale precision on large-area substrates as well as on complex geometries. Moreover, iCVD allows for room-temperature deposition on delicate substrates, including flexible organic materials, copy paper, and biomedical patches. This contribution presents the fundamentals of the iCVD process and highlights selected application examples.

Keywords: Chemical vapor deposition; Organic surfaces; Polymer thin films; Solvent-free; Initiated chemical vapor deposition