Dresden 2026 – wissenschaftliches Programm

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DS: Fachverband Dünne Schichten

DS 20: Poster

DS 20.27: Poster

Donnerstag, 12. März 2026, 18:30–20:30, P2

E-Beam Evaporation of thin metal and oxide films on Al2O3 (0001) — •Laurenz Hüffmeier, Tobias Pollenske, and Joachim Wollschläger — Institute of Physics, University of Osnabrück, Barbarastr. 7, 49076 Osnabrück, Germany

Ultrathin metal and oxide films are used in numerous fields of application, particularly in optics, electronics, and energy applications. With the increasing importance of these technologies, the requirements for these films are also rising in order to improve their properties. Precisely manufactured films with well defined structural and physical properties are required, as even minimal deviations in thickness or structure can significantly impair device performance. A suitable method for the growth of such layers is physical vapor deposition (PVD), which enables the controlled deposition of a wide variety of materials under high vacuum conditions. Here, electron beam evaporation (EBPVD) is advantageous since extremely clean films can be deposited and high evaporation rates of up to a few micrometers per second are possible.
Hence, in this work, ultrathin magnesium oxide, praseodymium oxide, cobalt, and platinum films were deposited on insulating Al2O3 (0001) substrates using EBPVD. The structural properties of the resulting layers were analyzed by XRR. XPS measurements were performed on all films to examine their near-surface chemical composition. For the cobalt layers deposited with different emission currents, XPS was performed both in situ and ex situ to investigate the influence of atmosphere conditions on the oxidation states.

Keywords: EBPVD; XPS; Cobalt; Oxides; Sapphire