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MA: Fachverband Magnetismus
MA 21: Skyrmions II
MA 21.4: Vortrag
Dienstag, 10. März 2026, 14:45–15:00, HSZ/0004
Optimization of magnetic skyrmion diffusion in thin films — •Alen John1, 2, Maria Andromachi Syskaki1, Jürgen Langer1, Gerhard Jakob2, and Mathias Kläui2 — 1Singulus Technologies AG, 63796 Kahl am Main, Germany — 2Institute of Physics, Johannes Gutenberg University Mainz, 55128 Mainz, Germany
Topological magnetic solitons, particularly skyrmions, have garnered significant interest for their potential in unconventional computing and sensing applications. In this work, we outline an optimized fabrication strategy for generating and stabilizing low-pinning magnetic skyrmions in magnetic thin films using magnetron sputtering. We focus on Ta/CoFeB/MgO heterostructures with perpendicular magnetic anisotropy and systematically vary key deposition parameters including sputter power and Ar pressure to optimize skyrmion formation. Furthermore, we incorporate an ultrathin Ta dusting layer at the CoFeB/MgO interface to precisely tune the interfacial anisotropy. This combined approach enables the realization of ultralow-pinning thin-film systems that reliably host room-temperature, thermally diffusing skyrmions. Such samples represent a promising platform for emerging applications in unconventional computing paradigms, including reservoir computing[1].
[1] J. Zázvorka et al., Nat. Nanotechnol. 14, 658 (2019)
Keywords: Skyrmions; Magnetron sputtering; Skyrmion diffusion; Unconventional computing; Reservoir computing