Dresden 2026 – wissenschaftliches Programm
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MA: Fachverband Magnetismus
MA 39: Poster Magnetism II
MA 39.7: Poster
Mittwoch, 11. März 2026, 18:00–21:00, P2
Application of 3D Nano-Lithography in Magnetism — •Jana Kredl1, Christian Denker1, Cornelius Fendler2, Julia Bethune1, Nina Meyer1, Theresa Brinker1, Finn-F. Stiewe1, Tobias Kleinke1, Chris Badenhorst1, Alena Rong1, Robin Silber3, Mark Doerr1, Raghvendra Palanakar1, Toni Hache6, Neha Jah1, Uwe T. Bornscheuer1, Marcel Kohlmann1, Hauke Lars Heyen1, Michaela Lammel4, Alexander Paarmann5, Andy Thomas4, Robert Blick2, Jakob Walowski1, Michaela Dalcea1, and Markus Muenzenberg1 — 1University of Greifswald, Germany — 2University of Hamburg — 3VSB-Technical University of Ostrava, Czech Republic — 4IFW Dresden, Gemany — 5Fritz Haber Institute of the Max Planck Society, Berlin, Germany — 6Helmholtz-Zentrum Dresden-Rossendorf, Germany
3D 2-Photon-Lithography, originally developed for 3D photonic crystals, opens a wide range of new possible applications in many fields, e.g. life sciences, micro-optics and mechanics. We will present our recent applications of 3D 2-Photon-lithography and show 3D evaporation masks for in-situ device fabrication using different deposition angles, infra-red laser light focusing lenses directly fabricated on optical fibers, tunnel structures for guiding growth of neurons [1], pillars for investigation of cell mechanics and master-mold fabrication for Polydimethylsiloxane (PDMS) micro-fluidic channels. Based on our experience we will discuss possible applications in magnetism. [1] C. Fendler et al., Adv. Biosys. 5 (2019) doi: 10.1002/adbi.201970054
Keywords: 3D 2-Photon-Lithography; Nano-Lthography; Electron-Lithography; Magnetism