Dresden 2026 – wissenschaftliches Programm
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MA: Fachverband Magnetismus
MA 52: Poster Magnetism III
MA 52.5: Poster
Donnerstag, 12. März 2026, 15:00–17:00, P4
Silicon ion implantation of YIG thin films for magnonics — •Richa Bhardwaj1, Jannis Bensmann1, Robert Schmidt1, Kirill O. Nikolaev2, Dimitri Raskhodchikov1, Shraddha Choudhary1, Shabnam Taheriniya3,4, Sven Niehues1, Akhil Varri1,3, Ahmad El Kadri1, Johannes Kern1, Wolfram H. P. Pernice1,3,4, Sergej O. Demokritov2, Vladislav E. Demidov2, Steffen Michaelis de Vasconcellos1, and Rudolf Bratschitsch1 — 1Institute of Physics and Center for Nanotechnology(CeNTech), UniversityofMünster — 2InstituteofAp- plied Physics, University of Münster — 3Center for Soft Nanoscience, University of Münster — 4Kirchhoff-Institute for Physics, Heidelberg University
Magnons hold the promise for novel computing architectures due to their low power consumption. Recently, magnonic YG waveguides have been demonstrated using a maskless silicon ion-implantation technique [1]. Here, we examine how silicon ion implantation modifies the structural, optical, and magneto-optical properties of YIG thin films. Our findings establish design guidelines for YIG improved spin-wave manipulation for magnonic integrated circuits. Reference: [1] J. Bensmann, et al., Nat. Mater. 24, 1920-1926 (2025).
Keywords: Spin-waves; Magnons; Magneto-optics