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MM: Fachverband Metall- und Materialphysik
MM 19: Poster Session
MM 19.21: Poster
Dienstag, 10. März 2026, 18:00–20:00, P5
Hydrogen-induced resistance response in nanoporous Pd-Cu thin film — •Yushen Huang1 and Shan Shi2, 1 — 1Institute of Hydrogen Technology, Helmholtz-Zentrum Hereon, Geesthacht, Germany — 2Research Group of Integrated Metallic Nanomaterials Systems, Hamburg University of Technology, Hamburg, Germany
The large-scale utilization of hydrogen energy requires high-performance sensing technologies for real-time hydrogen monitoring and leakage prevention. Pd-based hydrogen sensors are considered among the most promising candidates and are widely used in commercial devices due to palladium's strong affinity for hydrogen. However, during cyclic hydrogen absorption and desorption, Pd undergoes repeated phase transition, which can lead to accumulation of local misfit strains and defects. This results in signal hysteresis, prolonged response times, and poor reproducibility particularly in dense Pd films. Inspired by the excellent microstructural stability and actuation performance durability observed in nanoporous Pd bulk samples after over 1500 cycles of phase transition, this work investigates the potential of nanoporous Pd-Cu thin films for hydrogen sensing. In this work, a nanoporous Pd-Cu thin film (~100 nm thick) was prepared via electrochemical dealloying, and its electrical resistance response during electrochemical hydrogen charging was measured using a four-point probe method. Additionally, the pore size of nanoporous Pd-Cu will be tuned by adjusting the preparation conditions and post thermal treatment, enabling the sensors with enhanced stability, long-term reliability, and high-precision hydrogen monitoring.
Keywords: Hydrogen sensor; Palladium; Nanoporous thin film; Dealloy; Electrical resistance response